ALEXANDRIA, Va., June 9 -- United States Patent no. 12,652,991, issued on June 9, was assigned to ASM IP Holding B.V. (Almere, Netherlands).

"Semiconductor processing apparatus" was invented by JaeMin Roh (Hwaseong-si, South Korea) and ChangMin Lee (Hwaseong-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing apparatus capable of improving the uniformity of thin films on a substrate includes: a substrate support unit having a first slope; and a flow control ring arranged to surround the substrate support unit and having a second slope, wherein, during alignment, as the substrate support unit moves in a first direction, the first slope and the second slope contact each other,...