US Patent Issued to ASM IP Holding on June 23 for "Method of depositing condensable material onto a surface of a substrate" (Japanese Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,666,890, issued on June 23, was assigned to ASM IP Holding B.V. (Almere, Netherlands).

"Method of depositing condensable material onto a surface of a substrate" was invented by Hiroshi Kou (Tokyo) and Hideaki Fukuda (Hachioji, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Methods of depositing material onto a surface of a substrate. Exemplary methods include flowing a gas-phase precursor within the reaction chamber, condensing the precursor onto the surface of the substrate to form condensed material, and curing the condensed material to transform the condensed material to cured material. The step of curing can be a plasma process and can include...