ALEXANDRIA, Va., July 28 -- United States Patent no. 12,695,072, issued on July 28, was assigned to ASM IP Holding B.V. (Almere, Netherlands).

"Plasma ignition validation in a plasma-assisted wafer process background" was invented by BeomGyu Heo (Hwaseong-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "An apparatus for semiconductor processing may be provided. The apparatus may comprise a reactor chamber configured to process a wafer, a plasma generator to generate a plasma in the reactor chamber, a plasma control board provided with a power control to control the plasma power in the reactor chamber, and a process controller operably connected to the plasma control board and configured to set ...