ALEXANDRIA, Va., July 21 -- United States Patent no. 12,686,917, issued on July 21, was assigned to ASM IP Holding B.V. (Almere, Netherlands).
"Methods for depositing a film on a surface of a substrate by cyclical deposition methods including pulsed purge processes" was invented by Do Han Kim (Phoenix), Jereld Lee Winkler (Gilbert, Ariz.), Amit Mishra (Tempe, Ariz.), Paul Ma (Scottsdale, Ariz.), Todd Robert Dunn (Cave Creek, Ariz.) and Moataz Bellah Mousa (Chandler, Ariz.).
According to the abstract* released by the U.S. Patent & Trademark Office: "Methods for depositing a film on a surface of substrate by cyclical deposition methods including pulsed purge processed are disclosed. The pulsed purge processes include introducing a purge gas...