ALEXANDRIA, Va., Aug. 5 -- United States Patent no. 12,698,562, issued on Aug. 4, was assigned to ASM IP Holding B.V. (Almere, Netherlands).
"Method of particle abatement in a semiconductor processing apparatus" was invented by Cornelis Thaddeus Herbschleb (Leiden, Netherlands) and Kelly Houben (Lubbeek, Belgium).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method for particle abatement in a semiconductor apparatus is provided. In a preferred embodiment, the method comprises processing a substrate in a process chamber of the semiconductor processing apparatus. The processing comprises loading the substrate in the process chamber having one or more inner surfaces, providing a reaction gas mixture to the pr...