ALEXANDRIA, Va., Aug. 25 -- United States Patent no. 12,716,126, issued on Aug. 25, was assigned to ASM IP Holding B.V. (Almere, Netherlands).
"Selective deposition" was invented by Krzysztof Kamil Kachel (Chandler, Ariz.).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method, system and apparatus for selectively forming aluminum oxide on a first surface of a substrate relative to a second different surface of the substrate, the process comprising one or more super-cycles comprising sub-cycles: a) selectively depositing aluminum nitride on the first surface of the substrate relative to the second different surface of the substrate by one or more selective deposition sub-cycles, b) oxidizing at least a porti...