ALEXANDRIA, Va., May 12 -- United States Patent no. 12,624,441, issued on May 12, was assigned to ArcelorMittal (Luxembourg).
"Vacuum deposition facility and method for coating a substrate" was invented by Eric Silberberg (Haltinne, Belgium), Thiago Rabelo Nunes Campos (Vigy, France) and Negar Gilani (Metz, France).
According to the abstract* released by the U.S. Patent & Trademark Office: "A vacuum deposition facility for continuously depositing, on a running substrate, coatings formed from at least one metal inside a Vacuum deposition facility including a vacuum chamber, a coated substrate coated with at least one metal on both sides of the substrate and a coated metallic substrate."
The patent was filed on Aug. 12, 2024, under Applica...