ALEXANDRIA, Va., Feb. 17 -- United States Patent no. 12,553,119, issued on Feb. 17, was assigned to ArcelorMittal (Luxembourg).
"Vacuum deposition facility and method for coating a substrate" was invented by Eric Silberberg (Haltinne, Belgium), Sergio Pace (Jodoigne, Belgium) and Remy Bonnemann (Saint-Nicolas, Belgium).
According to the abstract* released by the U.S. Patent & Trademark Office: "A coated substrate obtainable by a method for continuously depositing, on a running substrate, coatings formed from at least one metal inside a vacuum deposition facility including a vacuum chamber. A vacuum deposition facility for producing such coated substrates."
The patent was filed on Aug. 16, 2024, under Application No. 18/807,440.
*For fur...