US Patent Issued to Applied Materials on Sept. 8 for "Process chamber gas supply improvement" (Japanese, American Inventors)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,729,438, issued on Sept. 8, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Process chamber gas supply improvement" was invented by Toshiyuki Nakagawa (Narita, Japan) and Shu-Kwan Lau (Sunnyvale, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A process chamber is provided including: a chamber body and one or more liners disposed around an interior volume; a gas manifold including a plurality of inlet portions and a plurality of outlet portions, each inlet portion fluidly coupled to one of the outlet portions; a plurality of gas inlet channels, each gas inlet channel formed by one or surfaces of the one or more liners and each gas i...