US Patent Issued to Applied Materials on Sept. 8 for "Lower deposition chamber CCP electrode cleaning solution" (American, Indian Inventors)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,731,771, issued on Sept. 8, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Lower deposition chamber CCP electrode cleaning solution" was invented by Mukesh Shivakumaraiah Chitradurga (Chitradurga, India), Luke Bonecutter (Cedar Park, Texas), Sathya Swaroop Ganta (Sunnyvale, Calif.), Canfeng Lai (Fremont, Calif.), Jay D. Pinson II (San Jose, Calif.), Kaushik Comandoor Alayavalli (Sunnyvale, Calif.) and Kallol Bera (Fremont, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments of the present disclosure generally relate to a substrate processing chamber, and methods for cleaning the substrate processing chamber are provided her...