US Patent Issued to Applied Materials on Sept. 8 for "Higher pressure purge for impurity reduction in radical treatment chamber" (Indian, American Inventors)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,731,769, issued on Sept. 8, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Higher pressure purge for impurity reduction in radical treatment chamber" was invented by Pradeep Sampath Kumar (Agra, India), Norman L. Tam (Cupertino, Calif.), Shashank Sharma (Fremont, Calif.), Eric R. Rieske (Livermore, Calif.), Victor Calderon (Sunnyvale, Calif.), Mahesh Ramakrishna (Basaveshwaranagar, India), Michael P. Kamp (San Ramon, Calif.), Dongming Iu (Union City, Calif.), Edward T. Xia (Santa Clara, Calif.) and Eric T. Tran (Santa Clara, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of post-deposition processing includes performing a...