US Patent Issued to Applied Materials on Sept. 22 for "Classification of defect patterns of substrates" (Indian, American Inventors)

ALEXANDRIA, Va., Sept. 24 -- United States Patent no. 12,743,765, issued on Sept. 22, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Classification of defect patterns of substrates" was invented by Chandrani Roy Chowdhury (Belmont, Calif.), Sanjiv Mittal (Fremont, Calif.), James Henry Gardner Jr. (Santa Cruz, Calif.), Mohana Roy Chowdhury (Bangalore, India), Sachin Dangayach (San Jose, Calif.), Victor Rotion D'souza (San Jose, Calif.), Rajesh Kumar Singal (Mountain House, Calif.), Rajesh Naidu Penagalapati (San Jose, Calif.) and Priyanka Jain (Nagpur, India).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method includes obtaining, by a processing device, data indicative of locations of defec...