US Patent Issued to Applied Materials on Sept. 22 for "Chamber impedance management in a processing chamber" (California Inventors)

ALEXANDRIA, Va., Sept. 24 -- United States Patent no. 12,744,185, issued on Sept. 22, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Chamber impedance management in a processing chamber" was invented by Linying Cui (Cupertino, Calif.), James Rogers (Los Gatos, Calif.), Keith Hernandez (Santa Clara, Calif.), William Chin (Santa Clara, Calif.) and Leonid Dorf (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments of the disclosure include an apparatus and a method for controlling plasma uniformity by controlling plasma density in the bulk plasma over the center region and circumferential edge region of the substrate. Plasma uniformity can be controlled by use of an RF tuni...