US Patent Issued to Applied Materials on Sept. 1 for "Processes to deposit amorphous-silicon etch protection liner" (California Inventors)

ALEXANDRIA, Va., Sept. 1 -- United States Patent no. 12,727,416, issued on Sept. 1, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Processes to deposit amorphous-silicon etch protection liner" was invented by Zeqing Shen (San Jose, Calif.), Bo Qi (San Jose, Calif.) and Abhijit B. Mallick (Fremont, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments of the present disclosure generally relate to fabricating electronic devices, such as memory devices. In one or more embodiments, a microelectronic device is provided and includes a film stack disposed on a substrate and a patterned hard mask disposed on an upper surface of the film stack. The film stack has a stack thickness and cont...