US Patent Issued to Applied Materials on Sept. 1 for "Dram devices having molybdenum sulfide channel" (California Inventors)

ALEXANDRIA, Va., Sept. 1 -- United States Patent no. 12,723,307, issued on Sept. 1, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Dram devices having molybdenum sulfide channel" was invented by Keith T. Wong (Mountain View, Calif.) and Hyojin Kim (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Methods of depositing a molybdenum sulfide film with increased sulfur:molybdenum ratio are described. The methods include pre-cleaning a dielectric material with oxygen radicals prior to formation of a molybdenum sulfide film that has a lower oxygen content than would be formed without the pre-cleaning."

The patent was filed on Oct. 10, 2023, under Application No. 18/378,425.

*For fu...