US Patent Issued to Applied Materials on Sept. 1 for "Contact resistance reduction for direct backside contact" (Massachusetts Inventors)

ALEXANDRIA, Va., Sept. 1 -- United States Patent no. 12,727,235, issued on Sept. 1, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Contact resistance reduction for direct backside contact" was invented by Jae Young Lee (Bedford, Mass.), Johannes M. Van Meer (Middleton, Mass.), Yan Zhang (Westford, Mass.) and Naushad K. Variam (Marblehead, Mass.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed herein are methods for direct backside contact formation. In some embodiments, a method may include providing a stack of layers defining a front side and a backside, wherein the front side comprises one or more devices, and forming a plurality of vias in the backside, wherein each via of the plur...