US Patent Issued to Applied Materials on Oct. 6 for "Target profile for a physical vapor deposition chamber target" (Singaporean Inventors)

ALEXANDRIA, Va., Oct. 6 -- United States Patent no. D1,151,521, issued on Oct. 6, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Target profile for a physical vapor deposition chamber target" was invented by Palaniappan Chidambaram (Singapore), Yaoying Zhong (Singapore), Siew Kit Hoi (Singapore) and Li Ying Choo (Singapore).

The patent was filed on Jan. 17, 2025, under Application No. D/986,103.

*For further information, including images, charts and tables, please visit: http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO2&Sect2=HITOFF&p=1&u=%2Fnetahtml%2FPTO%2Fsearch-bool.html&r=1&f=G&l=50&co1=AND&d=PTXT&s1=D1151521&OS=D1151521&RS=D1151521

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