US Patent Issued to Applied Materials on Oct. 20 for "Reflector for process chamber" (Indian, American Inventors)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,768,596, issued on Oct. 20, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Reflector for process chamber" was invented by Raja Murali Dhamodharan (Madurai, India), Shu-Kwan Lau (Sunnyvale, Calif.), Shainish Nellikka (Bangalore, India), Enle Choo (Saratoga, Calif.), Kalaivanan Mohanadass (Santa Clara, Calif.) and Aniketnitin Patil (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A modular reflective heating system for use in a process chamber is provided. The modular reflective heating system includes: a plurality of connectors; a plurality of lamps, each lamp connected to at least one of the connectors; a reflector includ...