US Patent Issued to Applied Materials on Oct. 20 for "Photo-emitting plasma for activation in processing chambers, and related apparatus and methods" (New York Inventor)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,772,779, issued on Oct. 20, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Photo-emitting plasma for activation in processing chambers, and related apparatus and methods" was invented by Abbas Rastegar (Schenectady, N.Y.).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure relates to photo-emitting plasma for gas activation in processing chambers, and related apparatus and methods. In one or more embodiments, a processing chamber applicable for semiconductor manufacturing includes one or more sidewalls, a window at least partially defining an internal volume, and a substrate support disposed in the internal volume. The p...