ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,770,828, issued on Oct. 20, was assigned to Applied Materials Inc. (Santa Clara, Calif.).
"Multi-electrode source assembly for plasma processing" was invented by Linying Cui (Cupertino, Calif.), James Rogers (Los Gatos, Calif.) and Rajinder Dhindsa (Pleasanton, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "Apparatus and methods for controlling the uniformity of a plasma formed using a radio frequency (RF) source power assembly that includes one or more resonant tuning circuits coupled to two or more electrodes disposed within a multi-electrode source assembly. Improved plasma uniformity control and reduced system cost are achieved by eliminating...