US Patent Issued to Applied Materials on Oct. 20 for "Liner and edge ring to prevent gas diffusion" (Indian, American Inventors)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,770,838, issued on Oct. 20, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Liner and edge ring to prevent gas diffusion" was invented by Shashidhara Patel H B (Bangalore, India), Amit Sahu (Bangalore, India), Muhannad Mustafa (Milpitas, Calif.), Sanjeev Baluja (Campbell, Calif.), Yixiong Yang (Fremont, Calif.) and Srinivas Gandikota (Santa Clara, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Process kits for semiconductor manufacturing processing chambers and semiconductor manufacturing processing chambers using the process kits are described. The process kits include an edge ring with a lower annular ring portion having a plural...