ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,787,724, issued on Nov. 3, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Neutral stress diamond-like carbon" was invented by Jialiang Wang (Santa Clara, Calif.), Soonil Lee (Santa Clara, Calif.), Eswaranand Venkatasubramanian (Santa Clara, Calif.) and Abhijit B. Mallick (Fremont, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure provides method of processing a substrate. The method includes flowing a deposition gas comprising a hydrocarbon compound into a processing volume of a process chamber having a substrate positioned on an electrostatic chuck. A plasma is generated at the substrate by applying a first RF ...