US Patent Issued to Applied Materials on Nov. 3 for "Influence function-based mitigation of substrate deformation with film deposition and ion implantation" (California, Massachusetts, Maine Inventors)

ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,787,717, issued on Nov. 3, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Influence function-based mitigation of substrate deformation with film deposition and ion implantation" was invented by Wonjae Lee (Fremont, Calif.), Pradeep Kumar Subrahmanyan (San Jose, Calif.), D. Jeffrey Lischer (Acton, Mass.) and Frank Sinclair (Hartland, Maine).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed systems and techniques are directed to correcting an out-of-plane (OPD) deformation of a substrate by causing a stress-compensation layer (SCL) to be deposited on the substrate, obtaining, using optical inspection data, a profile of the OPD of the ...