US Patent Issued to Applied Materials on Nov. 3 for "Dose mapping using substrate curvature to compensate for out-of-plane distortion" (California Inventor)

ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,783,773, issued on Nov. 3, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Dose mapping using substrate curvature to compensate for out-of-plane distortion" was invented by Pradeep Subrahmanyan (Cupertino, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method may include generating a residual curvature map for a substrate, the residual curvature map being based upon a measurement of a surface of the substrate. The method may include generating a dose map based upon the residual curvature map, the dose map being for processing the substrate using a patterning energy source; and applying the dose map to process the substrate using t...