US Patent Issued to Applied Materials on May 5 for "Rutile phase tiox deposition with preferred crystal orientations" (California Inventors)

ALEXANDRIA, Va., May 5 -- United States Patent no. 12,619,004, issued on May 5, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Rutile phase tiox deposition with preferred crystal orientations" was invented by Kenichi Ohno (Sunnyvale, Calif.) and Takashi Kuratomi (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments of the present disclosure generally relate to optical devices. More specifically, embodiments described herein relate to an optical device layer stack, an optical device formed from the optical device layer stack, and a method of forming an optical device layer stack."

The patent was filed on Sept. 30, 2022, under Application No. 17/936,911.

*For further in...