US Patent Issued to Applied Materials on May 5 for "Remote surface wave propagation for semiconductor chambers" (California Inventors)

ALEXANDRIA, Va., May 5 -- United States Patent no. 12,620,553, issued on May 5, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Remote surface wave propagation for semiconductor chambers" was invented by Yang Yang (Cupertino, Calif.), Fernando Silveira (Livermore, Calif.), Kartik Ramaswamy (San Jose, Calif.), Yue Guo (Redwood City, Calif.), A N M Wasekul Azad (Cupertino, Calif.) and Imad Yousif (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Apparatus provide plasma to a processing volume of a chamber. The Apparatus may comprise a plurality of plasma sources, each with at least a dielectric tube inlet which is at least partially surrounded by a conductive tube which is configu...