US Patent Issued to Applied Materials on May 5 for "Multiple-metal-containing metal-oxo photoresist films by CVD and ALD methods" (California Inventors)

ALEXANDRIA, Va., May 5 -- United States Patent no. 12,618,153, issued on May 5, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Multiple-metal-containing metal-oxo photoresist films by CVD and ALD methods" was invented by Lakmal Kalutarage (San Jose, Calif.), Madhur Sachan (Belmont, Calif.), Mark Saly (Milpitas, Calif.) and Zhenxing Han (Sunnyvale, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments disclosed herein include a method of forming a metal-oxo photoresist. In an embodiment, the method comprises flowing a first precursor into a chamber, where the first precursor comprises a first metal. In an embodiment, the method further comprises flowing a second precursor into the ...