US Patent Issued to Applied Materials on May 26 for "Model-based purge gas flow" (American, Indian Inventors)

ALEXANDRIA, Va., May 26 -- United States Patent no. 12,637,759, issued on May 26, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Model-based purge gas flow" was invented by Ala Moradian (Sunnyvale, Calif.), Vishwas Kumar Pandey (Madhya Pradesh, India), Lori D. Washington (San Jose, Calif.) and Miao-Chun Chen (Sunnyvale, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments herein provide for a method of processing a semiconductor substrate. The method described herein may include receiving a first input corresponding to a first geometric hardware configuration of a process chamber, receiving a second input corresponding to a first process recipe of the process chamber, determining...