US Patent Issued to Applied Materials on May 19 for "Semiconductor processing chambers and methods for cleaning the same" (American, Indian Inventors)

ALEXANDRIA, Va., May 19 -- United States Patent no. 12,630,920, issued on May 19, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Semiconductor processing chambers and methods for cleaning the same" was invented by Nitin Pathak (Mumbai, India), Yuxing Zhang (San Jose, Calif.), Tuan A. Nguyen (San Jose, Calif.), Kalyanjit Ghosh (Pleasanton, Calif.), Amit Bansal (Milpitas, Calif.) and Juan Carlos Rocha-Alvarez (San Carlos, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A processing chamber may include a gas distribution member, a substrate support, and a pumping liner. The gas distribution member and the substrate support may at least in part define a processing volume. The pumping liner ...