ALEXANDRIA, Va., May 12 -- United States Patent no. 12,626,032, issued on May 12, was assigned to Applied Materials Inc. (Santa Clara, Calif.).
"Using elemental maps information from x-ray energy-dispersive spectroscopy line scan analysis to create process models" was invented by Sundararaman Narayanan (Cupertino, Calif.) and Anantha R. Sethuraman (Palo Alto, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "Implementations disclosed describe a method of using a model to predict a change of a physical state of a sample caused by one or more stages of a technological process in a substrate processing apparatus and obtaining imaging data associated with an actual performance of the one or more stages of th...