ALEXANDRIA, Va., March 31 -- United States Patent no. 12,593,627, issued on March 31, was assigned to Applied Materials Inc. (Santa Clara, Calif.).
"Tungsten defluorination by high pressure treatment" was invented by Keith Tatseun Wong (Los Gatos, Calif.), Thomas Jongwan Kwon (Dublin, Calif.), Sean Kang (Santa Clara, Calif.) and Ellie Y. Yieh (San Jose, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "An annealing system is provided that includes a chamber body that defines a chamber, a support to hold a workpiece and a robot to insert the workpiece into the chamber. The annealing system also includes a first gas supply to provide a hydrogen gas, a pressure source coupled to the chamber to raise a press...