US Patent Issued to Applied Materials on March 31 for "Metal overhang for advanced patterning" (South Korean, American, Taiwanese Inventors)

ALEXANDRIA, Va., March 31 -- United States Patent no. 12,593,568, issued on March 31, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Metal overhang for advanced patterning" was invented by Jungmin Lee (Santa Clara, Calif.), Seong Ho Yoo (San Ramon, Calif.), Dieter Haas (San Jose, Calif.), Si Kyoung Kim (Gwangju-si, South Korea), Yu-hsin Lin (Zhubei, Taiwan) and Ji Young Choung (Hwaseong-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "Sub-pixel circuits and methods of forming sub-pixel circuits that may be utilized in an organic light-emitting diode (OLED) display are described herein. The adjacent metal-containing overhang structures defining each sub-pixel of the sub-pixel cir...