ALEXANDRIA, Va., March 31 -- United States Patent no. 12,592,363, issued on March 31, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Actively controlled gas inject for process temperature control" was invented by Zhepeng Cong (San Jose, Calif.), Ashur J. Atanos (San Jose, Calif.), Nimrod Smith (Cupertino, Calif.), Khokan C. Paul (Cupertino, Calif.) and Tao Sheng (Santa Clara, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A flow apparatus and process chamber having the same are described herein. In one example, flow apparatus for use in semiconductor processing comprises an inject assembly and an inductive heater coupled to the inject assembly. The inject assembly comprises an inject b...