US Patent Issued to Applied Materials on March 3 for "Chemical-dose substrate deposition monitoring" (California Inventors)

ALEXANDRIA, Va., March 3 -- United States Patent no. 12,568,800, issued on March 3, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Chemical-dose substrate deposition monitoring" was invented by Albert Barrett Hicks III (Sunnyvale, Calif.) and Serghei Malkov (Hayward, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Assemblies, system, methods, and devices for monitoring characteristics of a substrate disposed in a recess within a processing chamber. An assembly includes an enclosure structure forming an interior volume configured to support a substrate disposed within the interior volume. The substrate may be selectively removed from the enclosure structure. The enclosure structure may i...