ALEXANDRIA, Va., March 24 -- United States Patent no. 12,588,456, issued on March 24, was assigned to Applied Materials Inc. (Santa Clara, Calif.).
"Reflector plate for substrate processing" was invented by Dongming Iu (Union City, Calif.) and Jian Wu (San Jose, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "A reflector plate assembly for processing a substrate includes a reflector plate having a first surface, wherein the first surface is a bare polished surface, a reflector disk embedded within the reflector plate from the first surface, a coating layer on the reflector disk, and a pyrometer disposed through an opening of the reflector disk."
The patent was filed on Sept. 6, 2022, under Application...