US Patent Issued to Applied Materials on March 24 for "Methods for forming low resistivity contacts" (California Inventors)

ALEXANDRIA, Va., March 24 -- United States Patent no. 12,588,443, issued on March 24, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Methods for forming low resistivity contacts" was invented by Jiang Lu (Milpitas, Calif.), Liqi Wu (San Jose, Calif.), Wei Dou (Sunnyvale, Calif.), Weifeng Ye (San Jose, Calif.), Shih Chung Chen (Santa Clara, Calif.), Rongjun Wang (Dublin, Calif.), Xianmin Tang (San Jose, Calif.), Yiyang Wan (Sunnyvale, Calif.), Shumao Zhang (San Jose, Calif.) and Jianqiu Guo (Santa Clara, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Methods for reducing contact resistance include performing a selective titanium silicide (TiSi) deposition process on a middle of the line...