US Patent Issued to Applied Materials on March 24 for "Bottom purge for semiconductor processing system" (American, Indian Inventors)

ALEXANDRIA, Va., March 24 -- United States Patent no. 12,588,451, issued on March 24, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Bottom purge for semiconductor processing system" was invented by Nitin Pathak (Mumbai, India), Vinay Prabhakar (Cupertino, Calif.), Badri N. Ramamurthi (Los Gatos, Calif.), Viren Kalsekar (Mountain View, Calif.), Tuan A. Nguyen (San Jose, Calif.) and Juan Carlos Rocha-Alvarez (San Carlos, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Exemplary substrate processing systems may include a plurality of processing regions. The systems may include a transfer region housing defining a transfer region fluidly coupled with the plurality of processing regions. Th...