ALEXANDRIA, Va., March 17 -- United States Patent no. 12,577,668, issued on March 17, was assigned to Applied Materials Inc. (Santa Clara, Calif.).
"Methods of lowering deposition rate" was invented by Kunal Bhatnagar (Chandler, Ariz.) and Mohith Verghese (Phoenix).
According to the abstract* released by the U.S. Patent & Trademark Office: "A deposition method demonstrating a slower growth rate is disclosed. Some embodiments of the disclosure provide CVD methods which utilize a halide-containing growth inhibitor as a co-reactant with a metal halide precursor and a reactant. Some embodiments of the disclosure relate to CVD and ALD methods comprising exposure of the substrate surface to a pretreatment comprising a halide-containing growth i...