ALEXANDRIA, Va., March 17 -- United States Patent no. 12,581,926, issued on March 17, was assigned to Applied Materials Inc. (Santa Clara, Calif.).
"Methods and apparatus for processing a substrate" was invented by Bencherki Mebarki (Santa Clara, Calif.), Joung Joo Lee (San Jose, Calif.), Komal Garde (Santa Clara, Calif.), Kishor Kumar Kalathiparambil (Santa Clara, Calif.), Xianmin Tang (San Jose, Calif.), Xiangjin Xie (Fremont, Calif.) and Rui Li (San Jose, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "Methods and apparatus for processing a substrate are provided. For example, a method includes sputtering a material from a target in a PVD chamber to form a material layer on a layer comprising a feat...