US Patent Issued to Applied Materials on March 17 for "External substrate system rotation in a semiconductor processing system" (California Inventors)

ALEXANDRIA, Va., March 17 -- United States Patent no. 12,581,896, issued on March 17, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"External substrate system rotation in a semiconductor processing system" was invented by Tuan Anh Nguyen (San Jose, Calif.), Amit Kumar Bansal (Milpitas, Calif.) and Juan Carlos Rocha-Alvarez (San Carlos, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method and apparatus for processing a semiconductor is disclosed herein. In one embodiment, a processing system for semiconductor processing is disclosed. The processing chamber includes two transfer chambers, a processing chamber, and a rotation module. The processing chamber is coupled to the transfer ch...