US Patent Issued to Applied Materials on June 30 for "Apparatus and method for sensing RF signals from RF plasma processing equipment" (Irish Inventors)

ALEXANDRIA, Va., July 16 -- United States Patent no. 12,669,440, issued on June 30, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Apparatus and method for sensing RF signals from RF plasma processing equipment" was invented by Michael Hopkins (Kilbarrack, Ireland), Paul Scullin (Lucan, Ireland), JJ Lennon (Ballymun, Ireland) and Thomas Gilmore (Donabate, Ireland).

According to the abstract* released by the U.S. Patent & Trademark Office: "A sensing device for monitoring electromagnetic radiation emanating from a plasma processing system. The sensing device may, for example, comprise at least two of a first probe for detecting a time varying RF electric field, a second probe for detecting a time varying RF magnetic field, ...