US Patent Issued to Applied Materials on June 16 for "Low oxygen scanning UV source with localized purge" (American, Indian Inventors)

ALEXANDRIA, Va., June 16 -- United States Patent no. 12,656,688, issued on June 16, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Low oxygen scanning UV source with localized purge" was invented by Michael David-Scott Kemp (San Jose, Calif.), Daihua Zhang (Los Altos, Calif.), Ludovic Godet (Sunnyvale, Calif.), Mahendran Chidambaram (Saratoga, Calif.) and Sumedh Dattatraya Acharya (Bangalore, India).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method and apparatus for curing a substrate are described. The apparatus includes a curing apparatus with a casing and an ultraviolet (UV) radiation assembly coupled to the casing. The ultraviolet radiation assembly further includes a line UV radiati...