US Patent Issued to Applied Materials on July 28 for "Managing beam power effects by varying base emissivity" (Massachusetts, Maine Inventors)

ALEXANDRIA, Va., July 28 -- United States Patent no. 12,695,048, issued on July 28, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Managing beam power effects by varying base emissivity" was invented by Dawei Sun (Lynnfield, Mass.), Eric D. Hermanson (Georgetown, Mass.) and Benjamin E. Heneveld (Hiram, Maine).

According to the abstract* released by the U.S. Patent & Trademark Office: "A workpiece mounting system comprising a chuck and a base is disclosed. The emissivity of the base is increased to allow more heat transfer from the chuck to the base. In some embodiments, the emissivity of the base may be controllable so that for ion beams with lower power levels, the emissivity remains low, enabling the chuck to reach the d...