US Patent Issued to Applied Materials on July 28 for "Lithography stitching" (California Inventors)

ALEXANDRIA, Va., July 28 -- United States Patent no. 12,693,597, issued on July 28, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Lithography stitching" was invented by Yongan Xu (Santa Clara, Calif.), William Wilkinson (Fremont, Calif.) and Jing Guo (Fremont, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of forming patterned features on a substrate is provided. The method includes: positioning a first mask over a first portion of a substrate; directing radiation through the patterned area of the first mask at the first portion of the substrate to form a first patterned region on the substrate; positioning a second mask over a second portion of the substrate, the second mask...