US Patent Issued to Applied Materials on July 21 for "Symmetric antenna arrays for high density plasma enhanced process chamber" (South Korean, American Inventors)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,688,999, issued on July 21, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Symmetric antenna arrays for high density plasma enhanced process chamber" was invented by Zheng John Ye (Santa Clara, Calif.), Jeevan Prakash Sequeira (Milpitas, Calif.), Chien-Teh Kao (Sunnyvale, Calif.), Tae Kyung Won (San Jose, Calif.), Young Dong Lee (Hwaseong-Si, South Korea), Soo Young Choi (Fremont, Calif.), Suhail Anwar (Saratoga, Calif.) and Jianhua Zhou (Campbell, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure is directed to an antenna array. The antenna array includes a plurality of dielectric windows coupled to a support ...