US Patent Issued to Applied Materials on July 21 for "Purge system to clean wafer backside for ring susceptor" (California Inventor)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,690,405, issued on July 21, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Purge system to clean wafer backside for ring susceptor" was invented by Aniketnitin Patil (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method and apparatus for processing substrates applicable for use in semiconductor manufacturing. The method includes rotating a first shaft having a first perforation where at least a part of the first shaft is disposed within a second shaft. The method further includes flowing a gas through a piping, where the piping is coupled to a second perforation in the second shaft. The method also includes flowing th...