US Patent Issued to Applied Materials on July 21 for "High efficiency trap for particle collection in a vacuum foreline" (California Inventors)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,689,010, issued on July 21, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"High efficiency trap for particle collection in a vacuum foreline" was invented by James L'Heureux (Santa Clara, Calif.) and Ryan Thomas Downey (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments disclosed herein include a particle collection trap for an abatement system for abating compounds produced in semiconductor processes. The particle collection trap includes a device for producing spiral gas flow in the particle collection trap. The spiral gas flow causes particles, which are heavier than the gas, to travel to the outside diameter ...