US Patent Issued to Applied Materials on July 21 for "Arc reduction and RF control for electrostatic chucks in semiconductor processing" (California Inventors)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,686,923, issued on July 21, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Arc reduction and RF control for electrostatic chucks in semiconductor processing" was invented by Allison Yau (Mountain View, Calif.), Manoj Kumar Jana (San Jose, Calif.), Wen-Shan Lin (San Jose, Calif.), Zhiling Dun (Campbell, Calif.), Xinhai Han (Palo Alto, Calif.), Deenesh Padhi (Saratoga, Calif.), Jian Li (Fremont, Calif.), Yuanchang Chen (Santa Clara, Calif.), Wenhao Zhang (San Jose, Calif.), Edward P. Hammond (Hillsborough, Calif.), Alexander V. Garachtchenko (Brentwood, Calif.), Ganesh Balasubramanian (Fremont, Calif.), Juan Carlos Rocha-Alvarez (San Carlos, Calif.) and Sathya Ganta (Sun...