US Patent Issued to Applied Materials on July 21 for "Apparatus for clamping a substrate on a mono-polar electrostatic chuck for deposition of photoresist films" (California, Oregon Inventors)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,690,418, issued on July 21, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Apparatus for clamping a substrate on a mono-polar electrostatic chuck for deposition of photoresist films" was invented by Sushim Koshti (West Linn, Ore.), Vijay Parkhe (San Jose, Calif.), Nitin Bharadwaj Satyavolu (Santa Clara, Calif.), Venugopal Vellanki (San Jose, Calif.), Niranjana Balesan (Fremont, Calif.) and Ashutosh Sawant (Santa Clara, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Apparatuses for clamping a substrate on a mono-polar electrostatic chuck for deposition of photoresist films are disclosed. In an example, a lift-pin assembly includes ...