ALEXANDRIA, Va., July 14 -- United States Patent no. 12,680,173, issued on July 14, was assigned to Applied Materials Inc. (Santa Clara, Calif.).

"Process and apparatus to remove metal-containing films from a chamber" was invented by Kelvin Chan (San Ramon, Calif.) and Ruiying Hao (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments disclosed herein include methods for removing a metal containing layer from a chamber of a tool. In an embodiment, the method comprises generating a remote plasma in the tool. The method may continue with flowing reactive species from the remote plasma into the chamber, and flowing a hydrocarbon gas into the chamber. In an embodiment, the method may includ...